Physical Vapor Deposition

Physical Vapor Deposition Simulations of Microstructure Evolution

Ti-Cr-N Coatings Deposited by Physical Vapor Deposition on AISI D6 Tool Steels

In this study, physical vapor deposition (PVD) Ti-Cr-N coatings were deposited at two different temperatures 100 and 400ºC on hardened and tempered tool steel substrates. The influence of the applied deposition temperature on the physical and mechanical properties of coatings such as roughness, thickness, phase composition, hardness and Young’s modulus were evaluated. Phase compositions were st...

Modeling and Simulation for Physical Vapor Deposition: Multiscale Model

In this paper we present modeling and simulation for physical vapor deposition for metallic bipolar plates. In the models we discuss the application of different models to simulate the transport of chemical reactions of the gas species in the gas chamber. The so called sputter process is an extremely sensitive process to deposit thin layers to metallic plates. We have taken into account lower o...

Enhanced step coverage by oblique angle physical vapor deposition

We present the use of an oblique angle physical vapor deposition sOAPVDd technique with substrate rotation to obtain conformal thin films with enhanced step coverage on patterned surfaces. We report the results of ruthenium sRud films sputter deposited on trench structures with aspect ratio ,2 and show that OAPVD with an incidence angle less that 30° with respect to the substrate surface normal...

Controllable growth of aluminum nanorods using physical vapor deposition

This letter proposes and experimentally demonstrates that oxygen, through action as a surfactant, enables the growth of aluminum nanorods using physical vapor deposition. Based on the mechanism through which oxygen acts, the authors show that the diameter of aluminum nanorods can be controlled from 50 to 500 nm by varying the amount of oxygen present, through modulating the vacuum level, and by...